Development of New Technology for Wastewater Treatment for Semiconductor Production

A new study published in Chemical Engineering Journal demonstrates how a trace amount of copper to iron oxide completely decomposes alcohol in semiconductor wastewater.

Led by Dr. Sang Hoon Kim and Dr. Gun-hee Moon of the Extreme Materials Research Center, the research team succeeded in quickly degrading isopropyl alcohol by using UV light and a Fenton-like reaction. The homogeneously copper-doped iron oxide catalyst sped up alcohol degradation by more than four times.

This new wastewater treatment technology has proven more effective in treating wastewater containing alcohols than reverse osmosis, ozone, and biological decomposition. It also costs less and requires less water. With this new process, treating semiconductor wastewater would no longer need large volumes of water to reduce alcohol concentration.

Dr. Kim said his team’s research provides an effective solution to semiconductor wastewater treatment given the increasing number of large-scale semiconductor production lines.

Read the full article here to learn more about the promising wastewater treatment technology.

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